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“Optimising your vacuum process”

Atlas™

Atlas™ from Edwards: the range of combustion gas abatement solutions that offers semiconductor manufacturers reduced operating costs and enhanced ease-of-use.

Atlas™ systems have low fuel consumption compared with previous-generation gas abatement devices and utilize proven Alzeta™ inward-fired combustor technology to achieve significantly reduced costs of ownership. With one to six inlets with a number of options, including a temperature management system (TMS), they can reach a flow capacity of up to 600 slm and they offer enhanced ease-of-use and more efficient maintenance.                                                        
 

Atlas abatement technology specific to your process:

  • Atlas TCS for common CVD gases (NF3/F2)
  • Atlas TPU for PFC gases (ClF3, CF6, C3F8) in CVD processes
  • Atlas Kronis for the low-k CVD gases in next-generation processes
  • Atlas Etch for semicon etch and flat panel display processes (CF4, SF6 and high flow PFC’s)
  • Atlas Helios for safe treatment of hydrogen processes in epitaxy and MOCVD

 

OverView

Effective exhaust management of CVD processes must be able to handle the deposition gases and the associated powders. The fluoride wastes from cleaning gases also require suitable treatment along with global warming gases. Abatement systems must be able to comply with these requirements in one complete unit.

The Atlas TCS provides reliable, high performance, low cost abatement of flammable and acid gases from CVD exhausts. The Atlas TCS incorporates the unique inward-fired radiant combustor and high-efficiency multi-stage water scrubber developed for the Thermal Processing range and is ideally suited to the treatment of exhaust streams from CVD tools employing remote plasma NF3 cleans and high flows of F2.

Features and Benefits

High performance, robust abatement
Capable of removing pyrophoric and acid gases to below TLV
Safe treatment of up to 20 slpm fluorine
Excellent powder handling capabilities
Low cost of ownership
Water recirculation for reduced water usage
Full tool interfacing for utilities conservation
OEM recommended
Maximized tool uptime
Low thermal mass facilitates rapid servicing
Field proven, corrosion-resistant design
Small footprint
Supported by global field service organisation
Third-party certification
SEMI S2, F15 certified, ETL Listed

OverView

The Atlas TPU is a world proven system and the semiconductor industry's standard abatement system for CVD. In one model, there is suitability for all CVD and Etch applications, enabling World Semiconductor Council PFC emission reduction targets to be met. Each inlet can be individually configured for the highest level of abatement of all PFC gases, Fluorine (F2) or Chlorine TriFluoride (ClF3).

Features and Benefits

Low Cost of Ownership
Water Recirculation Unit (WRU) ensures low water usage
Unrivalled Abatement Performance
Independently verified
Provides high flow, high performance, CF4 abatement
Capable of treating high flows of ClF3
Robust Field Performance
Certified to SEMI S2, CE Marked and ETL Listed

OverView

Effective exhaust management of CVD processes must be able to handle the deposition gases and the associated powders. The fluoride wastes from cleaning gases also require suitable treatment along with global warming gases. Abatement systems must be able to comply with these requirements in one complete unit.
 
Achieving clean combustion of low k organosilane precursors is challenging, and failure to do so results in unacceptable by-products and blockages in downstream systems. Ultimately such blockages can cause unscheduled downtime. Edwards has gained an in-depth understanding of low k CVD process issues by working extensively with OEMs and materials suppliers during process development.

Features and Benefits

High performance abatement
Destroys all low k CVD precursors and clean species simultaneously
Complete reaction eliminates clogging issues
Environmental and health and safety compliance assured
Extensive OEM qualification program
Low cost of ownership
Controlled, cost-effective combustion
Option to run on compressed dry air
Water recirculation reduces water usage
Maximised tool uptime
Excellent handling of high powder volumes
Field-proven, corrosion-resistant design for chamber cleaning gases
Supported by Edwards’ global service team for unrivalled field reliability
Enhanced wafer security
PLC Controlled, tool interfacing and full system monitoring
Third-party certification
SEMI S2, F15 certified, ETL listed

OverView

Effective exhaust management of CVD processes must be able to handle the deposition gases and the associated powders. The fluoride wastes from cleaning gases also require suitable treatment along with global warming gases. Abatement systems must be able to comply with these requirements in one complete unit.

Features and Benefits

Proven high abatement performance for toxic, pyrophoric & corrosive gases
Reliable handling of associated powders
Controlled and complete oxidation of hydrogen to safe limits
Capable of handling up to 200 lpm of hydrogen
Up to 4 process inlets

OverView

Abatement solution for Generation 5, 6 and 7 Flat Panel Etch Processes

Application challenges

Modern FPD (Flat Panel Display) Etch processes combine the use of large PFC gases flows (typically SF6 and/or CF4) with large flows of Chlorine (Cl2) and Hydrochloric acid (HCl). A generation 6 etch process tool will typically combine 12slm of SF6 and/or 8slm of CF4, with 15slm of Cl2 or 15slm HCl. Combustion abatement methods are faced with three challenges: the combustion of large PFC gas flows (PFCs are extremely stable chemical compounds), in the presence of large Cl2 flows (chlorine acts as a flame-suppressant), and the management of acidic by-products (HCl, HF, H2SO4 and SO2).

Atlas Etch has successfully met with all three challenges. Optimisation of the combustion process and smart management of the gas input enable destruction and removal efficiencies (DREs) greater than 99% for SF6 and greater than 90% for CF4, even in the presence of Chlorine. The use of corrosion resistant materials in the design of the wet scrubbing stages ensures that Atlas Etch can remove acidic by-products reliably whilst maintaining low water consumption and high process uptime.

Features and Benefits

Proven high abatement performance for toxic, pyrophoric & corrosive gases
Reliable handling of associated powders
Controlled and complete oxidation of hydrogen to safe limits
Capable of handling up to 200 lpm of hydrogen
Up to 4 process inlets

Technical data

Process gas inlets / Bypass outlet :

Abatement system exhaust outlet :

Cabinet extraction outlet:

NW40 stainless steel

75 mm diameter polypropylene

150 mm diameter x 150 mm deep, painted mild steel

Documentation