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Optimizing process performance just became easier with the DELTA™ Flow Ratio Controller (FRC). Widely used in a variety of flow splitting applications such as etching, stripping, and PECVD, the DELTA™ Flow Ratio Controller (FRC) provides users with the ability to distribute gas or gas mixtures to different zones in a process chamber. Send the DELTA™ Flow Ratio Controller (FRC) a gas - or any mixture - and a ratio set point and the DELTA™ Flow Ratio Controller (FRC) will divide the gas into separate output channels automatically.
Process Optimization through Precise Ratio Control
DELTA™ II Flow Ratio Controller is a critical process control instrument in the MKS line of digital control, web-enabled products providing the latest in gas flow ratio measurement and control technology necessary to meet the demands of multi-channel flow distribution. It divides and controls mixed process gas flows to either multiple chambers or zones within a process chamber at ratios specified by the user maximizing process uniformity and repeatability. Send DELTA™ II a gas - or any mixture - and a ratio set point and it will split the gas into two separate output channels automatically and precisely.
DELTA™ II mass flow ratio controller is used in a variety of flow splitting applications such as etch, strip, and CVD.
Drop-in Replacement for the Original DELTA™ FRC
DELTA™ II "Stretch Body" FRC has the same capabilities as the widely-used DELTA™ II, with significantly improved performance versus the original DELTA™ FRC. This "Stretched" version differs from the standard DELTA™ II only in its mechanical interface - it "fits" the space where older DELTA™ FRCs are used without tool plumbing changes. All DELTA™ FRCs share the same DeviceNet™ profile - no changes to host software are needed.
For Process Optimization of Critical Deposition and Etch Processes
The DELTA™ III Flow Ratio Controller is a critical process control instrument in the MKS line of digital control, web-browser products. Available with EtherCAT® or DeviceNet™ communications, this device provides the latest in gas flow ratio measurement and control technology necessary to meet the demands of multi-channel flow distribution for semiconductor, flat panel, and solar panel process uniformity control.
The DELTA™ series mass flow ratio controllers divide and control mixed process gas flows to either multiple chambers or zones within a process chamber at proportions specified by the user to optimize process uniformity and repeatability. The DELTA™ series flow ratio controllers with their superior performance and compact design are the latest offerings from MKS's industry leading DELTA™ controllers enabling process gas flow ratio control.
DELTA™ III mass flow ratio controller is used in a variety of flow splitting applications such as etch, strip, and CVD.
For Process Optimization of Critical Deposition and Etch Processes
DELTA™ IV 4-zone Flow Ratio Controller is a digital controlled, browser-enabled, process control instrument, available in EtherCAT® or DeviceNet™ providing the latest gas flow ratio measurement and control technology to meet the demands of multi-channel flow distribution for semiconductor, flat panel, and solar panel process uniformity and control.
DELTA™ mass flow ratio controllers divide and control mixed process gas flows to multiple chambers or zones at user-specified proportions, optimizing process uniformity and repeatability.
DELTA™ IV mass flow ratio controller is used in a variety of flow splitting applications such as etch, strip, and CVD.
