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DELTA Flow Ratio Controllers

Optimizing process performance just became easier with the DELTA™ Flow Ratio Controller (FRC). Widely used in a variety of flow splitting applications such as etching, stripping, and PECVD, the DELTA™ Flow Ratio Controller (FRC) provides users with the ability to distribute gas or gas mixtures to different zones in a process chamber. Send the DELTA™ Flow Ratio Controller (FRC) a gas - or any mixture - and a ratio set point and the DELTA™ Flow Ratio Controller (FRC) will divide the gas into separate output channels automatically.

Products

GE50A DELTA™ II Flow Ratio Controller

Process Optimization through Precise Ratio Control

DELTA™ II Flow Ratio Controller is a critical process control instrument in the MKS line of digital control, web-enabled products providing the latest in gas flow ratio measurement and control technology necessary to meet the demands of multi-channel flow distribution. It divides and controls mixed process gas flows to either multiple chambers or zones within a process chamber at ratios specified by the user maximizing process uniformity and repeatability. Send DELTA™ II a gas - or any mixture - and a ratio set point and it will split the gas into two separate output channels automatically and precisely.

Download data sheet for more information

Features

  • Embedded Ethernet for device monitoring during operation
  • Uses standard web browser - no special software required.
  • Patented control algorithm for faster response-to-ratio set point
  • Wider dynamic control range for ratio control down to 5% of flow channel Full Scale flow
  • Bright LED display for easy viewing of flow ratio, temperature and Ethernet address

Applications

DELTA™ II mass flow ratio controller is used in a variety of flow splitting applications such as etch, strip, and CVD.

DELTA™ II "Stretch Body" Flow Ratio Controller

Drop-in Replacement for the Original DELTA™ FRC

DELTA™ II "Stretch Body" FRC has the same capabilities as the widely-used DELTA™ II, with significantly improved performance versus the original DELTA™ FRC. This "Stretched" version differs from the standard DELTA™ II only in its mechanical interface - it "fits" the space where older DELTA™ FRCs are used without tool plumbing changes. All DELTA™ FRCs share the same DeviceNet™ profile - no changes to host software are needed.

 

Download data sheet for more information

Features

  • Drop-in replacement for older DELTA™ FRCs - no changes to host tool hardware/software needed
  • Bright LED display for easy viewing of flow ratio, temperature and Ethernet address
  • Embedded Ethernet for device monitoring during operation
  • Uses standard web browser - no special software required.
  • Patented control algorithm for faster response-to-ratio set point
  • Wider dynamic control range for ratio control down to 5% of flow channel full Scale Flow
  • Normally open valves with higher conductance (lower pressure drop) vs. older versions

DELTA™III
3-zone Flow Ratio Controller

For Process Optimization of Critical Deposition and Etch Processes

The DELTA™ III Flow Ratio Controller is a critical process control instrument in the MKS line of digital control, web-browser products. Available with EtherCAT® or DeviceNet™ communications, this device provides the latest in gas flow ratio measurement and control technology necessary to meet the demands of multi-channel flow distribution for semiconductor, flat panel, and solar panel process uniformity control.

The DELTA™ series mass flow ratio controllers divide and control mixed process gas flows to either multiple chambers or zones within a process chamber at proportions specified by the user to optimize process uniformity and repeatability. The DELTA™ series flow ratio controllers with their superior performance and compact design are the latest offerings from MKS's industry leading DELTA™ controllers enabling process gas flow ratio control.

Download DNET data sheet for more information

Download ECAT data sheet for more information

Features

  • Accurate & repeatable flow ratio control for better process optimization
  • Control flow proportion independent of the process gas mix
  • Digital control loop for rapid response to channel set point
  • Increase tool uptime with fewer "No Problem Found" product replacements
  • Embedded diagnostics and software to check functionality without removal
  • E-diagnostics with embedded Ethernet interface for monitoring performance during operation
  • Uses standard web browser - no special software required

Applications

DELTA™ III mass flow ratio controller is used in a variety of flow splitting applications such as etch, strip, and CVD.

DELTA™ IV
4-zone Flow Ratio Controller

For Process Optimization of Critical Deposition and Etch Processes

DELTA™ IV 4-zone Flow Ratio Controller is a digital controlled, browser-enabled, process control instrument, available in EtherCAT® or DeviceNet™ providing the latest gas flow ratio measurement and control technology to meet the demands of multi-channel flow distribution for semiconductor, flat panel, and solar panel process uniformity and control.

DELTA™ mass flow ratio controllers divide and control mixed process gas flows to multiple chambers or zones at user-specified proportions, optimizing process uniformity and repeatability.

Download DNET data sheet for more information

Download ECAT data sheet for more information

Features

  • Accurate & repeatable flow ratio control for better process optimization
  • Control flow proportion independent of the process gas mix
  • Digital control loop for rapid response to channel set point
  • Increase tool uptime with fewer "No Problem Found" product replacements
  • Embedded diagnostics and software to check functionality without removal
  • E-diagnostics with embedded Ethernet interface for monitoring performance during operation
  • Uses standard web browser - no special software required

Applications

DELTA™ IV mass flow ratio controller is used in a variety of flow splitting applications such as etch, strip, and CVD.