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High pressure compact quadrupole process monitors without differential pumping.
HPQ3 allows operation far beyond the 1e-4 mbar total pressure limit of other residual gas analyzers without the need for differential pumping. Field-proven technology coupled with the latest innovative electronics platform derived from the Microvision 2 family give data quality not previously seen in this class of instrument. The HPQ3 has a variety of software control options to match the requirements of any application.
HPQ3 can be used for processes where data is required up to a total pressure of 1.3⁻³mbar.
High pressure compact quadrupole process monitors without differential pumping.
HPQ3S allows operation far beyond the 1e-4 mbar total pressure limit of other residual gas analyzers without the need for differential pumping. Field-proven technology coupled with the latest innovative electronics platform derived from the Microvision 2 family give data quality not previously seen in this class of instrument. The HPQ3S has a variety of software control options to match the requirements of any application.
For specific higher pressure applications up to 1⁻²mbar the HPQ3S makes real-time corrections using a gauge pressure from the tool or by using a variety of optional independent gauges fitted to a custom F-Chamber designed for optimum performance.
The HPQ3 and HPQ3S are suitable for a wide range of applications in PVD or for vacuum systems with inert residual gases including:
